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C00354 - SEMI C3.54 - シラン(SiH4)のガス純度ガイドライン StdTpc-Process Chemicals - Bases SEMI C14-95 (Reapproved 1102)

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Description

SEMI C14-95 (Reapproved 1102)

that has the following capabilities

This Document defines the method of FPD glass substrate surface roughness measurement by stylus method surface roughness measurement instrument

and 150 mm diameter wafers

C00354 - SEMI C3.54 - シラン(SiH4)のガス純度ガイドライン StdTpc-Process Chemicals - Bases SEMI C14-95 (Reapproved 1102)global Gases Technical Committee2011912global Audits and Reviews Subcommittee201110www. semiviews. org www. semi. org199720069 : 2011 Referenced SEMI Standards None.

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