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SEMI G66-96 (Reapproved 0823)
white light confocal microscopy
which is an intrinsic polarizer property
This test may also be applied to semiconductor materials other than silicon and to insulators other than silicon dioxide
P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools StdPbc-0526 SEMI G66-96 (Reapproved 0823)This Standard defines the common mask data format specifications based on OASIS for mask tools, namely OASIS. MASK. OASIS. MASK specification applies to the input data format for mask tools. Referenced SEMI Standards (purchase separately) SEMI P39 Specification for OASIS Open Artwork System Interchange Standard Revision History SEMI P44 1216 (Reapproved 0124) SEMI P44 1216 (technical revision) SEMI P44 0316 (technical revision) SEMI P44 0211
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